Eindhoven, Netherlands

Peter J Van Den Berk

This inventor holds 1 USPTO granted patent. Top assignee: U.S. Philips Corporation. Active years: 1979.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Peter J Van Den Berk. Retrieved from https://idiyas.com/inventor/peter-j-van-den-berk

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 1979

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1 patent (USPTO):Explore Patents

Title: The Innovations of Peter J Van Den Berk

Introduction

Peter J Van Den Berk is a notable inventor based in Eindhoven, Netherlands. He has made significant contributions to the field of electronics, particularly with his innovative designs and patents. His work has been recognized for its impact on technology and engineering.

Latest Patents

One of his most notable patents is the lacquer-encapsulated carbon film resistor. This invention features a ceramic substrate coated with a carbon film, a silicon nitride layer, an organic lacquer layer, and termination electrodes. This design enhances the performance and durability of electronic components.

Career Highlights

Peter J Van Den Berk is associated with U.S. Philips Corporation, a leading company in the electronics industry. His role at Philips has allowed him to work on various projects that push the boundaries of technology. His expertise in materials and electronic components has been instrumental in the development of new products.

Collaborations

Peter has collaborated with several professionals in his field, including his coworker Gerrit Verspui. Their combined efforts have led to advancements in electronic design and innovation.

Conclusion

Peter J Van Den Berk's contributions to the field of electronics through his patents and collaborations highlight his importance as an inventor. His work continues to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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