Flagstaff Hill, Australia

Peter J Murphy

USPTO Granted Patents = 2 

Average Co-Inventor Count = 7.5

ph-index = 2

Forward Citations = 22(Granted Patents)


Company Filing History:


Years Active: 2011-2013

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2 patents (USPTO):Explore Patents

Title: Innovations of Peter J Murphy

Introduction

Peter J Murphy is an accomplished inventor based in Flagstaff Hill, Australia. He has made significant contributions to the field of electrochromic technology, holding two patents that showcase his innovative approach to creating advanced materials.

Latest Patents

Murphy's latest patents include processes for producing electrochromic substrates and electrochromic articles made therefrom. The first patent provides a process for producing an electroactive substrate. This process involves providing a substrate with an oxidant layer, exposing it to a vapor containing a polymerizable aryl or heteroaryl monomer, and polymerizing this monomer in the presence of a volatile Lewis base. The result is a polyaryl or polyheteroaryl electroactive polymer film on the substrate's surface. The second patent describes an electrochromic assembly that includes first and second electrodes, a porous membrane, and an electrolyte. This assembly is designed to be flexible, with a transparent electrolytic layer that enhances its functionality.

Career Highlights

Murphy's work at Smr Patents S.À.r.l. has positioned him as a key player in the development of electrochromic technologies. His innovative processes have the potential to revolutionize how electroactive materials are utilized in various applications.

Collaborations

Murphy has collaborated with notable colleagues such as Jakub Henryk Mazurkiewicz and Gordon George Wallace. Their combined expertise has contributed to the advancement of their projects and the successful development of new technologies.

Conclusion

Peter J Murphy's contributions to electrochromic technology through his patents and collaborations highlight his role as a leading inventor in this field. His innovative processes and dedication to advancing technology continue to make a significant impact.

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