Peter H Wackman, Deceased

Title: The Innovative Contributions of Peter H. Wackman

Introduction

Peter H. Wackman was a notable inventor whose work significantly impacted the field of X-ray lithography. He was based in Wauwatosa, WI (US) and held a total of 4 patents during his career. His innovative methods and systems have paved the way for advancements in plasma technology and X-ray applications.

Latest Patents

Wackman's latest patents include the "Plasma Pinch X-ray Method" and the "X-ray Lithography System." The Plasma Pinch X-ray Method provides a technique for producing plasma pinch X-rays that are usable in X-ray lithography. This method involves generating ionized heated plasma from solid material without causing an explosion. X-rays are produced by passing high current through the plasma, which creates a radial inward magnetic field pinching effect. This separation of plasma generation and X-ray pinch functions allows for accurate control, improved intensity performance, and greater flexibility in selecting X-ray emitting materials. The X-ray Lithography System shares similar principles, emphasizing the importance of the common electrode structure for both plasma generation and pinching, facilitating efficient X-ray emission.

Career Highlights

Wackman worked at Eaton Corporation, where he contributed to the development of advanced technologies in his field. His innovative spirit and dedication to research led to significant advancements in X-ray lithography, making him a respected figure in the industry.

Collaborations

Throughout his career, Wackman collaborated with notable colleagues, including Louis Cartz and Arnold Weiss. These partnerships fostered an environment of innovation and creativity, further enhancing the impact of their collective work.

Conclusion

Peter H. Wackman's contributions to the field of X-ray lithography and plasma technology remain influential. His inventive spirit and dedication to advancing technology have left a lasting legacy in the world of innovation.