The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 12, 1985
Filed:
Sep. 20, 1982
Louis Cartz, Milwaukee, WI (US);
Arnold Weiss, Minneapolis, MN (US);
Herman P Schutten, Milwaukee, WI (US);
Gordon B Spellman, Mequon, WI (US);
Stanley V Jaskolski, Sussex, WI (US);
Peter H Wackman, deceased, late of Wauwatosa, WI (US);
Eaton Corporation, Cleveland, OH (US);
Abstract
A system is provided for producing plasma pinch X-rays usable in X-ray lithography. Ionized heated plasma vapor is repeatably generated directly from solid material by impingement of a plurality of circumferentially spaced laser beams to generate an annulus of plasma. X-rays are generated by passing high current through the annular plasma in an axial gap between the solid material target electrode and another electrode, causing magnetic field radial inward plasma pinching to a central constricted area further heating the plasma and emitting X-rays. A central axially directed laser may further heat the plasma in the pinched area.