Company Filing History:
Years Active: 2002
Title: The Innovations of Peter E Rall
Introduction
Peter E Rall is an accomplished inventor based in Morenci, Michigan. He is known for his significant contributions to the field of chemical mechanical polishing. With a focus on non-spherical silica particles, Rall has developed innovative solutions that enhance the efficiency of polishing processes in integrated circuits.
Latest Patents
Rall holds a patent for "Abrasive media and aqueous slurries for chemical mechanical polishing and planarization." This patent discloses non-spherical silica particles with a nodular morphology, which are utilized as abrasive media in chemical mechanical polishing. The patent also details aqueous slurries containing monodispersed non-spherical nodular shaped particles, with mean effective diameters ranging from about 100 to 300 nanometers. These slurries are specifically designed for the chemical mechanical polishing and planarization of oxide dielectrics, metals, and metal/metallic compound interlayers in integrated circuits.
Career Highlights
Rall's career is marked by his work at Silbond Corporation, where he has made significant advancements in the field of abrasive media. His innovative approaches have contributed to the development of more effective polishing techniques, which are crucial for the manufacturing of high-performance electronic devices.
Collaborations
Throughout his career, Rall has collaborated with notable colleagues, including John A Negrych and George Haag. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and the advancement of technology in the field.
Conclusion
Peter E Rall's contributions to the field of chemical mechanical polishing through his innovative patents and collaborative efforts have made a lasting impact on the industry. His work continues to influence the development of advanced materials and processes in electronics manufacturing.