The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 01, 2002
Filed:
Dec. 07, 1999
Applicant:
Inventors:
John A. Negrych, Adrian, MI (US);
George Haag, Manitou Beach, MI (US);
Peter E. Rall, Morenci, MI (US);
William J. Corbell, Weston, MI (US);
Assignee:
Silbond Corporation, Weston, MI (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09K 3/14 ; C09G 1/02 ;
U.S. Cl.
CPC ...
C09K 3/14 ; C09G 1/02 ;
Abstract
Non-spherical silica particles having nodular morphology for use as an abrasive media in chemical mechanical polishing are disclosed. Also disclosed are aqueous slurries of monodispersed non-spherical nodular shaped particles having mean effective diameters between about 100 and 300 nanometers for chemical mechanical polishing. In addition aqueous slurries for the chemical mechanical polishing and planarization of oxide dielectric, metal, and metal/metallic compound interlayers of integrated circuits are disclosed.