This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2004.
Company Filing History:
Years Active: 2004
Title: The Innovative Contributions of Peter Chen
Introduction
Peter Chen is a notable inventor based in San Francisco, CA. He has made significant contributions to the field of materials science, particularly in the area of semiconductor manufacturing. His work focuses on improving the adhesion properties of fluorinated silicate glass (FSG) layers, which are crucial in various electronic applications.
Latest Patents
Peter Chen holds a patent for a method of nitrogen doping of fluorinated silicate glass (FSG) while removing the photoresist layer. This innovative method enhances the adhesion between the nitrogen-containing FSG layer and other layers, such as barrier layers. The patent describes a process where a gaseous mixture, comprising silicon, fluorine, oxygen, and nitrogen gases, is supplied to a process chamber. Energy is applied to this mixture to deposit the nitrogen-containing FSG layer onto a substrate. The method also includes the formation of a plasma from the gaseous mixture to facilitate the deposition process. This nitrogen doping technique is particularly beneficial in damascene processes, where nitrogen dopants are introduced into the surface of the FSG layer, resulting in improved adhesion with barrier layers for copper.
Career Highlights
Peter Chen is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work at Applied Materials has allowed him to contribute to advancements in semiconductor manufacturing technologies. With a focus on innovative solutions, he continues to push the boundaries of materials science.
Collaborations
Peter has collaborated with several talented individuals in his field, including Christopher S Ngai and Christopher Dennis Bencher. These collaborations have fostered a creative environment that encourages the development of groundbreaking technologies.
Conclusion
Peter Chen's contributions to the field of materials science, particularly through his patent on nitrogen doping of fluorinated silicate glass, highlight his innovative spirit and dedication to advancing semiconductor technologies. His work at Applied Materials, Inc. continues to influence the industry positively.