This inventor holds 1 USPTO granted patent, plus 1 CIPO patent. Top assignees: Centre National De La Recherche Scientifique, L'ecole Centrale De Marseille, Thales. Active years: 2018.
Company Filing History:
1 out of 5,383 
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Years Active: 2018
Title: Pernelle Marone-Hitz: Innovator in Space Applications
Introduction
Pernelle Marone-Hitz is a notable inventor based in Lyons, France. She has made significant contributions to the field of space applications through her innovative designs and patents. Her work exemplifies the intersection of engineering and creativity, particularly in the development of specialized materials.
Latest Patents
One of her key patents is for a "Tape with Smooth Deployment." This invention features a tape that can exist in both a fully wound stable state and a fully unwound stable state, specifically designed for space applications. The tape's unique design includes a continuous portion of wound tape with a first radius of curvature greater than a threshold value, and an unwound portion with a second radius of curvature less than the threshold value. This innovative design ensures that the tape maintains stability and functionality under varying temperature conditions, making it ideal for use in space.
Career Highlights
Throughout her career, Pernelle has worked with prominent organizations such as Thales and the Centre National de La Recherche Scientifique. Her experience in these institutions has allowed her to refine her skills and contribute to groundbreaking projects in the aerospace sector.
Collaborations
Pernelle has collaborated with esteemed colleagues, including François Guinot and Stéphane Vezain. These partnerships have fostered an environment of innovation and have led to the successful development of her patented technologies.
Conclusion
Pernelle Marone-Hitz is a pioneering inventor whose work in space applications has made a lasting impact. Her innovative tape design showcases her ability to address complex challenges in engineering. Through her patents and collaborations, she continues to inspire future generations of inventors.