Company Filing History:
Years Active: 2015-2025
Title: The Innovative Contributions of Periya Gopalan
Introduction
Periya Gopalan is a notable inventor based in San Jose, California. He has made significant contributions to the field of polishing technology, holding a total of 8 patents. His work focuses on enhancing the efficiency and effectiveness of polishing pads used in various applications.
Latest Patents
Gopalan's latest patents include a "Polishing pad with secondary window seal." This invention features a polishing article with a unique aperture design that enhances its functionality. The polishing article includes a projection that extends inwardly into the aperture, ensuring a secure fit for the window that is integral to its operation. Another notable patent is the "Printed chemical mechanical polishing pad having particles therein." This method involves using a 3D printer to create a polishing layer with a specific distribution of particles embedded within a polymer matrix, showcasing Gopalan's innovative approach to manufacturing.
Career Highlights
Periya Gopalan is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display industries. His work at Applied Materials has allowed him to push the boundaries of polishing technology, contributing to advancements that benefit various sectors.
Collaborations
Gopalan has collaborated with talented individuals such as Rajkumar Alagarsamy and Yongqi Hu. These partnerships have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.
Conclusion
Periya Gopalan's contributions to polishing technology through his patents and collaborations highlight his role as a significant inventor in the field. His work continues to influence advancements in the industry, showcasing the importance of innovation in technology.