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Title: Innovations by Pengfei Liang: A Pioneering Inventor in Photolithography
Introduction
Pengfei Liang, based in Beijing, China, is an innovative inventor known for his contributions to the field of photolithography. With a focus on enhancing manufacturing processes, he has developed a patent that showcases his expertise and creativity in the technological sphere.
Latest Patents
Pengfei Liang holds a notable patent that encompasses a mask, a mask assembly, an exposure machine, a method for testing the shadowing effect on a window, and a photolithography method. This patent introduces a mask that includes a light transmission area and a functional window positioned adjacent to it. It also features detection marks, with one mark flush against the border of the functional window and another located between the light transmission area and the functional window. This innovation is crucial for advancements in photolithography, especially in improving accuracy and efficiency in manufacturing processes.
Career Highlights
Throughout his career, Pengfei Liang has made significant strides in the technology sector. He has worked with prominent companies such as BOE Technology Group Co., Ltd. and Ordos Yuansheng Optoelectronics Co., Ltd. His experience in these organizations has enabled him to refine his skills and contribute to the development of cutting-edge technologies.
Collaborations
During his career, Pengfei Liang has collaborated with talented individuals, including Jiabin Cui and Li Wang. These collaborations have allowed him to exchange ideas and enhance the creativity necessary for innovation in technology.
Conclusion
Pengfei Liang's contributions to the field of photolithography through his inventive patents highlight his dedication to advancing technology. His work not only reflects his personal ingenuity but also underscores the importance of collaboration in cultivating innovation. As technology continues to evolve, inventors like Pengfei Liang play a pivotal role in shaping the future.