The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 19, 2022
Filed:
Dec. 08, 2017
Boe Technology Group Co., Ltd., Beijing, CN;
Ordos Yuansheng Optoelectronics Co., Ltd., Inner Mongolia, CN;
Jiabin Cui, Beijing, CN;
Li Wang, Beijing, CN;
Zhibin Li, Beijing, CN;
Pengfei Liang, Beijing, CN;
Chang Liu, Beijing, CN;
Peng Chen, Beijing, CN;
BOE TECHNOLOGY GROUP CO., LTD., Beijing, CN;
ORDOS YUANSHENG OPTOELECTRONICS CO., LTD., Inner Mongolia, CN;
Abstract
A mask, a mask assembly, an exposure machine, a method for testing shadowing effect on a window, and a photolithography method are provided. The mask includes a light transmission area; a functional window provided at a side of the light transmission area; and at least one of a first detection mark and a second detection mark; wherein the first detection mark is flushed with a border of the functional window adjacent to an interior of the mask; and the second detection mark is disposed between the profile of the light transmission area and the functional window.