This inventor holds 1 USPTO granted patent and 5 published patent applications. Top assignee: Applied Materials, Inc.. Active years: 2024.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2024
Title: Peng Liu - Innovator in Polishing Fluid Collection Technologies
Introduction
Peng Liu is a notable inventor based in Xi'an, China. He has made significant contributions to the field of electronic device manufacturing through his innovative work on polishing fluid collection systems. His expertise in this area has led to the development of a patented technology that enhances the efficiency of chemical mechanical polishing processes.
Latest Patents
Peng Liu holds a patent for a "Polishing fluid collection apparatus and methods related thereto." This invention provides a system for collecting and reusing polishing fluids used during the chemical mechanical polishing (CMP) of substrates in electronic device manufacturing. The apparatus features a catch basin designed to surround a polishing platen, allowing for effective collection and reuse of polishing fluids.
Career Highlights
Peng Liu is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display industries. His work focuses on improving manufacturing processes and enhancing the sustainability of production methods. Liu's innovative approach has positioned him as a key figure in the development of advanced manufacturing technologies.
Collaborations
Throughout his career, Peng Liu has collaborated with esteemed colleagues, including Lizhong Sun and Jianjun Hu. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and the advancement of technology in the field.
Conclusion
Peng Liu's contributions to polishing fluid collection technologies exemplify the importance of innovation in the electronic device manufacturing industry. His patented inventions and collaborative efforts continue to drive advancements in manufacturing processes, showcasing his commitment to enhancing efficiency and sustainability.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
