Company Filing History:
Years Active: 2015-2016
Title: Pendar Ardalan: Innovator in Low K Dielectric Films
Introduction
Pendar Ardalan is a notable inventor based in Palo Alto, CA, specializing in advancements related to low K dielectric films. With a total of 2 patents, Ardalan has made significant contributions to the semiconductor industry.
Latest Patents
His latest patents include a method and apparatus for depositing a low K dielectric film with one or more features. This innovative method involves positioning a substrate in a processing chamber, delivering a deposition gas, and depositing a dense organosilicon layer that comprises a porogenic carbon. The process further includes transferring a pattern into the dense organosilicon layer and forming a pore-forming plasma to create a porous organosilicon layer. Additionally, he has developed an adhesion layer that minimizes dielectric constant increase while maintaining good adhesion strength in a Plasma-Enhanced Chemical Vapor Deposition (PECVD) process.
Career Highlights
Pendar Ardalan is currently employed at Applied Materials, Inc., where he continues to push the boundaries of technology in semiconductor manufacturing. His work focuses on enhancing the performance and efficiency of dielectric materials.
Collaborations
Throughout his career, Ardalan has collaborated with talented individuals such as Kang Sub Yim and Sure Ngo, contributing to a dynamic and innovative work environment.
Conclusion
Pendar Ardalan's contributions to the field of low K dielectric films exemplify his commitment to innovation and excellence in semiconductor technology. His patents reflect a deep understanding of material science and engineering, positioning him as a key figure in the industry.
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