Espoo, Finland

Pekka Alitalo

This inventor holds 1 USPTO granted patent. Top assignee: Aalto University Foundation. Active years: 2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Pekka Alitalo. Retrieved from https://idiyas.com/inventor/pekka-alitalo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2012

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Pekka Alitalo: Innovator in Electromagnetic Wave Reduction

Introduction

Pekka Alitalo is a notable inventor based in Espoo, Finland. He has made significant contributions to the field of electromagnetic wave technology. His innovative work focuses on structures that can effectively reduce the scattering of electromagnetic waves.

Latest Patents

Pekka Alitalo holds a patent for a "Structure for reducing scattering of electromagnetic waves." This invention involves a structure made of materials that are invisible in certain frequency bands. It includes a transmission line network with a matching layer at the boundary of the material. The design supports structures within the transmission line network, ensuring that it is matched with the surrounding space. He has 1 patent to his name.

Career Highlights

Pekka Alitalo is associated with the Aalto University Foundation, where he continues to engage in research and development. His work has implications for various applications in telecommunications and materials science.

Collaborations

Throughout his career, Pekka has collaborated with esteemed colleagues, including Jukka Venermo and Sergei A Tretyakov. These partnerships have enhanced his research and contributed to advancements in the field.

Conclusion

Pekka Alitalo's innovative contributions to electromagnetic wave technology highlight his role as a leading inventor. His work not only advances scientific understanding but also paves the way for future technological developments.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…