Peizhen Hong

Title: Peizhen Hong: Innovator in Semiconductor Manufacturing

Introduction

Peizhen Hong is a prominent inventor based in Beijing, China. He has made significant contributions to the field of semiconductor manufacturing, showcasing his expertise through innovative methods and techniques. His work has implications for the efficiency and effectiveness of semiconductor devices.

Latest Patents

Peizhen Hong holds a patent for a method of manufacturing a semiconductor device. This method involves forming a gate stack on a substrate, etching the substrate on both sides of the gate stack to create C-shaped source/drain grooves, and subsequently wet-etching these grooves to form Ω-shaped source/drain grooves. This innovative approach allows for increased stress applied to the channel region, precise control over the depth of the source/drain grooves, and a reduction in roughness of the side walls and bottom portions of the grooves, ultimately minimizing defects.

Career Highlights

Peizhen Hong is affiliated with the Chinese Academy of Sciences, where he continues to advance research in semiconductor technology. His work is characterized by a commitment to enhancing the manufacturing processes of semiconductor devices, which are crucial for modern electronics.

Collaborations

Peizhen Hong collaborates with notable colleagues, including Changliang Qin and Huaxiang Yin. These partnerships foster a dynamic research environment that encourages innovation and the sharing of ideas.

Conclusion

Peizhen Hong's contributions to semiconductor manufacturing exemplify the importance of innovation in technology. His patented methods not only improve manufacturing processes but also pave the way for advancements in the semiconductor industry.