Ann Arbor, MI, United States of America

Peiyuan Li

This inventor holds 1 USPTO granted patent. Top assignee: Medarray, Inc.. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Peiyuan Li. Retrieved from https://idiyas.com/inventor/peiyuan-li-yaq9mwuk

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Peiyuan Li: Innovator in Siloxane Based Hollow Fibers

Introduction

Peiyuan Li is a notable inventor based in Ann Arbor, MI (US). He has made significant contributions to the field of materials science, particularly through his innovative work on hollow fibers. His research focuses on enhancing gas permeability characteristics, which has important applications in various industries.

Latest Patents

Peiyuan Li holds a patent for "Siloxane based hollow fibers." This invention provides hollow fibers characterized by a gas permeability metric, specifically a PMP greater than 30,000 Barrer*MPa. The patent also includes curable compositions and silicone elastomers produced by curing these compositions. Furthermore, it outlines methods for creating the hollow fibers and devices that incorporate them.

Career Highlights

Li is currently associated with Medarray, Inc., where he continues to push the boundaries of innovation in material applications. His work has garnered attention for its potential to revolutionize how hollow fibers are utilized in various technologies.

Collaborations

Some of his notable coworkers include Jean P Montoya and Victor M Montoya, who contribute to the collaborative environment that fosters innovation at Medarray, Inc.

Conclusion

Peiyuan Li's contributions to the field of hollow fibers exemplify the impact of innovative thinking in material science. His patent on siloxane based hollow fibers showcases his commitment to advancing technology and improving industrial applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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