Pittsburgh, PA, United States of America

Peijun J Chen


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 1994

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1 patent (USPTO):Explore Patents

Title: Peijun J Chen: Innovator in Silicon Etching Technology

Introduction

Peijun J Chen is a prominent inventor based in Pittsburgh, PA. With a focus on advancements in silicon etching technology, he has contributed to the field through his innovative patents. His work plays a significant role in enhancing the processing techniques for silicon substrates, a vital component in semiconductor manufacturing.

Latest Patents

Peijun J Chen holds a patent for a groundbreaking invention titled "Process for Controlling Silicon Etching by Atomic Hydrogen." This patented process allows for precise spatial control over the etching of silicon substrates using atomic hydrogen, all while maintaining operational efficiency at room temperature. The methodology involves implanting boron dopants into selective areas of the silicon substrate, followed by an etching process with atomic hydrogen. Remarkably, the implanted regions resist etching, offering robust control and potential applications in silicon device fabrication.

Career Highlights

Peijun J Chen currently contributes his expertise at the University of Pittsburgh. His academic and professional career is marked by a dedication to research and development in materials science, particularly in the realm of semiconductor technologies. His innovative approaches are indicative of his commitment to advancing the field of silicon etching.

Collaborations

Throughout his career, Peijun J Chen has collaborated with esteemed colleagues, including John T Yates, Jr. and M Luigi Colaianni. These partnerships reflect a collaborative spirit within the academic community, aimed at driving innovation and enhancing research outcomes in semiconductor technology.

Conclusion

Peijun J Chen stands out as a significant figure in the arena of silicon processing innovations. His patent for controlling silicon etching by atomic hydrogen exemplifies his inventive contributions, which have the potential to influence future developments in semiconductor manufacturing. With a strong foundation in research and collaborative efforts at the University of Pittsburgh, he continues to pave the way for advancements in technology that can benefit various industries reliant on silicon-based solutions.

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