Peichun Wang

Title: Peichun Wang: Innovator in Laminate Structures

Introduction

Peichun Wang is a notable inventor based in Shanghai, China. He has made significant contributions to the field of materials science, particularly in the development of laminate structures. His innovative work has led to the filing of a patent that addresses critical issues in inter-metal dielectric layers.

Latest Patents

Peichun Wang holds a patent for a laminate structure and a test method for detecting inter-metal dielectric layer defects. The patent describes a conducting layer-dielectric layer-conducting layer (CDC) laminate structure. This structure includes a dielectric layer formed on a substrate, a first conducting layer with a first metal region and openings, and a second conducting layer that is separated from the first by the dielectric layer. The design allows for effective detection of defects in the inter-metal dielectric layer, enhancing the reliability of electronic components.

Career Highlights

Peichun Wang is currently employed at Montage Technology Co., Ltd. His work at the company focuses on advancing technologies related to semiconductor materials and structures. His expertise in laminate structures has positioned him as a key player in the field.

Collaborations

Peichun Wang collaborates with talented individuals such as Xiong Zhang and Chunlai Sun. Their combined efforts contribute to the innovative projects at Montage Technology Co., Ltd.

Conclusion

Peichun Wang's contributions to laminate structures and his patent for detecting dielectric layer defects highlight his role as an influential inventor in the field. His work continues to impact the development of reliable electronic components.