Pei Xin Quan

Title: Pei Xin Quan - Innovator in Semiconductor Technology

Pei Xin Quan is a notable inventor based in Beijing, China. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent related to the rapid heat treatment of semiconductor wafers.

Latest Patents

Pei Xin Quan holds a patent for an "Induction system for rapid heat treatment of semiconductor wafers." This invention involves a mechanical system that transports a semiconductor wafer into or out of a quartz housing filled with a protective gas. The wafer is positioned between two graphite plates, and an RF induction coil surrounding the quartz housing heats these plates. The radiation emitted from the heated graphite plates raises the wafer's temperature from room temperature to a desired elevated temperature. The design includes a reflector means in the form of a second smaller housing that enhances heating efficiency by reflecting radiation back towards the graphite plates. This innovative approach accelerates the heating process and improves the uniformity of the wafer's temperature.

Career Highlights

Pei Xin Quan is affiliated with Tsinghua University, where he continues to engage in research and development in semiconductor technologies. His work has garnered attention for its practical applications in improving the efficiency of semiconductor manufacturing processes.

Collaborations

Pei Xin Quan has collaborated with several esteemed colleagues, including Dong Yan Hou and Bi-Xian Chen, who contribute to the advancement of technology in their respective fields.

Conclusion

Pei Xin Quan's contributions to semiconductor technology through his innovative patent demonstrate his commitment to enhancing manufacturing processes. His work not only reflects his expertise but also the collaborative spirit of research and development in the field.