Pei-Hsiu Wu

Title: Pei-Hsiu Wu: Innovator in Semiconductor Technology

Introduction

Pei-Hsiu Wu is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, holding two patents that showcase his innovative approach to enhancing manufacturing processes.

Latest Patents

Wu's latest patents focus on a method for dummy fin profile control to enlarge the gate process window. This method involves forming isolation regions that extend into a semiconductor substrate, with semiconductor strips located between these regions. A dielectric dummy strip is formed between the isolation regions, which are then recessed. Some portions of the semiconductor strips protrude higher than the top surfaces of the recessed isolation regions, creating protruding semiconductor fins. Additionally, a portion of the dielectric dummy strip also protrudes higher, forming a dielectric dummy fin. The method includes etching the dielectric dummy fin to ensure that its top width is smaller than its bottom width. A gate stack is then formed on the top surfaces and sidewalls of both the protruding semiconductor fins and the dielectric dummy fin.

Career Highlights

Pei-Hsiu Wu is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to develop innovative solutions in semiconductor manufacturing. His work has been instrumental in advancing the efficiency and effectiveness of semiconductor processes.

Collaborations

Wu collaborates with talented colleagues, including Shih-Yao Lin and Chih-Han Lin, who contribute to the innovative environment at their workplace.

Conclusion

Pei-Hsiu Wu's contributions to semiconductor technology through his patents and work at Taiwan Semiconductor Manufacturing Company Limited highlight his role as a key innovator in the field. His advancements are paving the way for future developments in semiconductor manufacturing.