Pei H Yih

Title: Pei H Yih: Innovator in Integrated Circuit Technology

Introduction

Pei H Yih is a notable inventor based in Orlando, FL (US), recognized for his contributions to integrated circuit technology. He has been instrumental in developing innovative solutions that enhance the performance and reliability of electronic devices.

Latest Patents

Pei H Yih holds a patent for a "Diffusion Preventing Barrier Layer in Integrated Circuit Inter-Metal Layer Dielectrics." This invention involves a cap or barrier layer designed to prevent the migration of impurities in low dielectric constant materials. By doing so, it protects conductive elements in multi-level integrated circuit structures from potential damage. The integrated circuit can be fabricated by placing the diffusion-preventing barrier layer between a first dielectric layer and the conductive layer at the upper level. This innovative approach allows for in-situ formation of the barrier layer over impurity-containing dielectric materials, thus avoiding contamination from moisture or hydrogen absorption during processing.

Career Highlights

Pei H Yih has made significant strides in his career, particularly while working at Agere Systems Inc. His expertise in integrated circuit technology has led to advancements that benefit the electronics industry. His work is characterized by a commitment to improving the integrity and functionality of electronic components.

Collaborations

Pei has collaborated with talented individuals such as Mahjoub Ali Abdelgadir and Nace Layadi, contributing to a dynamic work environment that fosters innovation and creativity.

Conclusion

Pei H Yih's contributions to integrated circuit technology exemplify the impact of innovative thinking in the electronics field. His patent for a diffusion preventing barrier layer showcases his dedication to enhancing the reliability of electronic devices.