Pei Duan

Title: Pei Duan: A Visionary Innovator from Shenzhen

Introduction

Pei Duan, an accomplished inventor based in Shenzhen, China, has made significant contributions to the field of telecommunications and technology. With two patents to his name, Duan has demonstrated a profound ability to innovate and address challenges in modern communication systems.

Latest Patents

Pei Duan's most recent inventions include a **Phase-locked loop circuit, configuration method therefor, and communication apparatus**. This invention presents a phase-locked loop circuit that features a main circuit and a phase temperature compensation circuit. The unique aspect of this circuit is its ability to generate a phase shift due to temperature changes, effectively countering the phase shifts produced by the main circuit. Additionally, Duan has developed a **Method and apparatus for identifying types of user geographical locations**. This innovative approach determines geographical location types by analyzing multiple uploading times and establishing probability values to ascertain the type of location.

Career Highlights

Duan has gained valuable experience while working with prominent companies in the technology sector. Notably, he has been associated with Tencent Technology (Shenzhen) Company Limited and ZTE Corporation. His work in these organizations has not only enhanced his expertise but has also fostered an environment of innovation and collaboration.

Collaborations

Throughout his career, Pei Duan has worked alongside talented individuals, including colleagues Zhibin Liu and Bo Zheng. Their collaboration has undoubtedly contributed to the successful development of innovative technologies and solutions within the industry.

Conclusion

Pei Duan exemplifies the spirit of innovation through his impactful contributions to communication technology. With his impressive portfolio of patents and collaboration with industry leaders, Duan continues to pave the way for future advancements in telecommunications. His work not only addresses current technological challenges but also inspires the next generation of inventors and innovators.