Company Filing History:
Years Active: 2007-2008
Title: Innovations by Pavel N. Laptev in Wafer Etching Technology
Introduction
Pavel N. Laptev is a notable inventor based in Santa Barbara, CA, who has made significant contributions to the field of wafer etching technology. With a total of 3 patents to his name, Laptev's work focuses on enhancing the precision and efficiency of surface etching processes.
Latest Patents
Laptev's latest patents include a system and method for etching a surface on a wafer. This innovative approach involves the use of first and second electrodes positioned at opposite ends, with magnets placed between them to define an enclosure. In this setup, inert gas molecules, such as argon, are introduced into the enclosure through an opening near the first electrode. The first electrode is biased at a high voltage, creating a high-intensity negative electrical field, while the second electrode is set at a low negative voltage, producing a low-intensity negative electrical field. This configuration allows electrons to move in a helical path, ionizing the inert gas molecules. The wafer, which has a floating potential and an insulating layer, is closely spaced from the second electrode. The interaction between the electrodes and the wafer defines two capacitors that control the movement of gas ions, resulting in a smooth, uniform, and accurate etch of the insulating layer.
Career Highlights
Pavel N. Laptev has been instrumental in advancing wafer etching technology through his innovative patents. His work at Tegal Corporation has positioned him as a key figure in the industry, contributing to the development of methods that enhance the precision of semiconductor manufacturing processes.
Collaborations
Laptev collaborates with Valery V. Felmetsger, further enriching the research and development efforts at Tegal Corporation.
Conclusion
Pavel N. Laptev's contributions to wafer etching technology exemplify the impact of innovative thinking in the field of semiconductor manufacturing. His patents reflect a commitment to advancing precision and efficiency in this critical area of technology.