The Hague, Netherlands

Pavel Aseev


Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Pavel Aseev: Innovator in Fabrication Methods

Introduction

Pavel Aseev is a notable inventor based in The Hague, Netherlands. He has made significant contributions to the field of fabrication methods, particularly in relation to semiconductor structures. His innovative approach has led to the development of a unique patent that enhances the efficiency of material application in semiconductor technology.

Latest Patents

Pavel Aseev holds a patent that discloses various fabrication methods. In one such method, at least one structure is formed on a substrate, which protrudes outwardly from a plane of the substrate. A beam is utilized to form a layer of material, with at least part of this material being in direct contact with a semiconductor structure on the substrate. This semiconductor structure comprises at least one nanowire. The beam is directed at a non-zero angle of incidence relative to the normal of the plane of the substrate. This angle allows the beam to impact one side of the protruding structure, preventing a portion of the nanowire in a shadow region adjacent to the other side from being covered with the material. Pavel Aseev's patent is a testament to his innovative thinking and technical expertise, with 1 patent to his name.

Career Highlights

Pavel Aseev is currently associated with Microsoft Technology Licensing, LLC, where he continues to work on advancing fabrication technologies. His role at Microsoft allows him to collaborate with other leading experts in the field, further enhancing his contributions to innovation.

Collaborations

Pavel has worked alongside notable colleagues such as Kevin Van Hoogdalem and Leonardus Petrus Kouwenhoven. These collaborations have fostered an environment of creativity and innovation, leading to advancements in their respective fields.

Conclusion

Pavel Aseev is a distinguished inventor whose work in fabrication methods has the potential to impact the semiconductor industry significantly. His innovative patent and collaborations with esteemed colleagues highlight his commitment to advancing technology.

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