Paulus F Van Hal

Title: Paulus F Van Hal: Innovator in Ceramic Substrates

Introduction

Paulus F Van Hal is a notable inventor based in Eindhoven, Netherlands. He has made significant contributions to the field of ceramic materials, particularly in the development of substrates suitable for semiconductor technology. With a total of two patents to his name, Van Hal's work is recognized for its innovative approach and practical applications.

Latest Patents

Van Hal's latest patents focus on methods of making substrates from a novel type of ceramic material. The first patent describes a substrate that comprises 44-47 at. % Al, 31-39 at. % O, 8-13 at. % C, and 8-12 at. % N. These substrates exhibit high heat conductance and great strength, with a coefficient of expansion equal to that of silicon. This makes them particularly suitable for use in silicon-semiconductor technology. The main component of the ceramic material corresponds to the formula Al.sub.28 O.sub.21 C.sub.6 N.sub.6. The invention also outlines methods for manufacturing substrates and other moldings from this material.

Career Highlights

Paulus F Van Hal is associated with U.S. Philips Corporation, where he has been instrumental in advancing ceramic technology. His work has not only contributed to the company's portfolio but has also had a broader impact on the semiconductor industry.

Collaborations

Van Hal has collaborated with notable colleagues, including Marcellinus J Kraan and Gijsbertus De With. These partnerships have fostered innovation and have been essential in the development of his patented technologies.

Conclusion

Paulus F Van Hal stands out as an influential inventor in the realm of ceramic substrates. His innovative patents and collaborations have significantly advanced the field, particularly in semiconductor applications.