Herkenbosch, Netherlands

Paulus F A Buijsen

This inventor holds 2 USPTO granted patents. Top assignees: Dsm IP Assets B.v., Other. Active years: 2001-2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Paulus F A Buijsen. Retrieved from https://idiyas.com/inventor/paulus-f-a-buijsen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 50.0

Average Co-Inventor Count = 5.0

ph-index = 2

Forward Citations = 19(Granted Patents)


Company Filing History:


Years Active: 2001-2005

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2 patents (USPTO):Explore Patents

Title: Paulus F A Buijsen: Innovator in Radiation-Curable Compositions

Introduction

Paulus F A Buijsen is a notable inventor based in Herkenbosch, Netherlands. He has made significant contributions to the field of radiation-curable compositions, holding two patents that showcase his innovative spirit and technical expertise.

Latest Patents

His latest patents include a "Radiation-curable composition and products coated therewith" and a "Carbonylation catalyst system." The first patent provides radiation-curable compositions that are low in reactive diluents while maintaining a sufficiently low viscosity for various coating applications, particularly in optical fibers. The second patent involves a catalyst system comprising a palladium compound, an acid compound with a specific pKa, and a non-symmetrical bidentate phosphorous ligand.

Career Highlights

Throughout his career, Buijsen has worked with various companies, including DSM IP Assets B.V. His work has significantly impacted the development of advanced materials and coatings.

Collaborations

He has collaborated with notable professionals in his field, including Otto E Sielcken and Henk Oevering. These collaborations have further enriched his contributions to innovation.

Conclusion

Paulus F A Buijsen's work in radiation-curable compositions and catalyst systems highlights his role as a key innovator in his field. His patents reflect a commitment to advancing technology and improving material applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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