Hatfield, United Kingdom

Paul Swann

This inventor holds 2 USPTO granted patents, plus 1 CIPO patent. Top assignee: Opro International Limited. Active years: 2012-2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Paul Swann. Retrieved from https://idiyas.com/inventor/paul-swann

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 2012-2016

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2 patents (USPTO):Explore Patents

Title: Paul Swann - Innovator in Mouthguard Technology

Introduction

Paul Swann is a notable inventor based in Hatfield, GB. He has made significant contributions to the field of mouthguard technology, holding 2 patents that showcase his innovative approach to improving user experience and safety.

Latest Patents

One of his latest patents is a 'boil and bite' mouthguard that includes projections designed to enhance the molding process to the user's teeth. This innovative mouthguard also features a base-wall configuration that minimizes thinning during both molding and use. Another patent describes a similar 'boil and bite' mouthguard with the same enhancements, emphasizing the importance of effective molding for optimal performance.

Career Highlights

Paul Swann is currently associated with Opro International Limited, a company known for its commitment to producing high-quality mouthguards. His work at Opro has allowed him to focus on developing products that prioritize user comfort and safety.

Collaborations

Throughout his career, Paul has collaborated with notable individuals, including Peter Searle, which has contributed to the advancement of his projects and innovations.

Conclusion

In summary, Paul Swann is a dedicated inventor whose work in mouthguard technology has led to significant advancements in user safety and comfort. His patents reflect a commitment to innovation that continues to impact the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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