Neugutstr, Switzerland

Paul-René Muralt

This inventor holds 1 USPTO granted patent. Top assignee: Unaxis-Balzers Aktiengesellschaft. Active years: 2003.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Paul-René Muralt. Retrieved from https://idiyas.com/inventor/paul-renandeacute-muralt

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2003

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1 patent (USPTO):Explore Patents

Title: The Innovations of Paul-René Muralt

Introduction

Paul-René Muralt is a notable inventor based in Neugutstr, Switzerland. He has made significant contributions to the field of plasma enhanced chemical vapor deposition. His innovative methods have the potential to improve the efficiency of coating treatments.

Latest Patents

Muralt holds a patent for a method aimed at enhancing the rate of plasma enhanced vacuum treatment. This method focuses on increasing the treatment rate of workpieces while minimizing the exposure of coatings to ion impact. The technique involves maintaining a non-vanishing dust particle density along the surface being treated, with a controlled density distribution. This distribution can be managed by applying a field of force parallel to the surface, which acts on the dust particles within the plasma discharge.

Career Highlights

Muralt is associated with Unaxis Balzers Aktiengesellschaft, a company known for its advancements in coating technologies. His work has contributed to the development of more efficient processes in the industry.

Collaborations

One of his notable collaborators is Jacques Schmitt, with whom he has worked on various projects related to plasma technology.

Conclusion

Paul-René Muralt's innovative approaches in plasma enhanced chemical vapor deposition demonstrate his commitment to advancing technology in the field. His contributions are paving the way for more efficient coating processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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