This inventor holds 1 USPTO granted patent. Top assignee: Motorola Corporation. Active years: 1993.
Company Filing History:
Years Active: 1993
Title: Paul R Proctor: Innovator in Semiconductor Technology
Introduction
Paul R Proctor is a notable inventor based in Phoenix, AZ, recognized for his contributions to semiconductor technology. He has been instrumental in developing methods that enhance the fabrication of semiconductor structures. His innovative approach has led to the creation of a significant patent that showcases his expertise in the field.
Latest Patents
Paul R Proctor holds a patent for a "Method of forming substrate contact trenches and isolation trenches." This patent describes a method of fabricating a semiconductor structure that includes providing a substrate with at least one layer formed thereon. The process involves forming at least two trenches through the layer and into the substrate, where one trench is designated for isolation and the other for making contact to the substrate. After forming a trench liner on the sidewalls of the trenches, they are filled with doped semiconductor material. The trench designated for isolation undergoes anodization, followed by oxidation of the anodized trench fill material. This innovative method enhances the efficiency and effectiveness of semiconductor fabrication.
Career Highlights
Paul R Proctor has made significant strides in his career, particularly through his work at Motorola Corporation. His role at the company has allowed him to apply his inventive skills in practical applications, contributing to advancements in semiconductor technology. His patent reflects his commitment to innovation and excellence in his field.
Collaborations
Throughout his career, Paul has collaborated with notable colleagues, including Robert J Mattox and Syd R Wilson. These collaborations have fostered an environment of innovation and have contributed to the development of cutting-edge technologies in the semiconductor industry.
Conclusion
In summary, Paul R Proctor is a distinguished inventor whose work in semiconductor technology has led to significant advancements in the field. His patent for forming substrate contact trenches and isolation trenches exemplifies his innovative spirit and dedication to improving semiconductor fabrication methods. His contributions continue to influence the industry and inspire future innovations.