London, United Kingdom

Paul R Bradwell

This inventor holds 1 USPTO granted patent. Top assignee: Haden Drysys International Limited. Active years: 1987.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Paul R Bradwell. Retrieved from https://idiyas.com/inventor/paul-r-bradwell

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 1987

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1 patent (USPTO):Explore Patents

Title: Inventor Paul R. Bradwell: Innovating Material Application

Introduction: Paul R. Bradwell, based in London, GB, is a notable inventor recognized for his contributions to material application technologies. Holding a single patent, his work reflects significant innovation in the field, directly impacting various industries.

Latest Patents: Paul R. Bradwell’s patent, titled "Apparatus and method for applying material to articles," showcases his expertise in developing efficient techniques for material application. This innovation has the potential to enhance manufacturing processes and improve product quality.

Career Highlights: Currently, Paul serves at Haden Drysys International Limited, where he continues to push the boundaries of engineering and technology. His role within the company highlights his commitment to innovation and development in the field.

Collaborations: One of Paul’s notable collaborators is Peter Marsden, with whom he shares professional ties. Together, they contribute valuable insights and advancements that reflect their dedication to research and development in material applications.

Conclusion: Paul R. Bradwell exemplifies the spirit of innovation with his patented work and collaboration efforts. His contributions not only enrich the technological landscape but also inspire future inventors to explore new possibilities in material application.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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