Castro Valley, CA, United States of America

Paul Michael Dentinger

This inventor holds 2 USPTO granted patents. Top assignee: Other. Active years: 2002-2003.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Paul Michael Dentinger. Retrieved from https://idiyas.com/inventor/paul-michael-dentinger-6wgx0nru

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 50.0

Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 27(Granted Patents)


Company Filing History:

goldMedal2 out of 834,601 
Other
 patents

Years Active: 2002-2003

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2 patents (USPTO):Explore Patents

Title: Innovations of Paul Michael Dentinger

Introduction

Paul Michael Dentinger is an accomplished inventor based in Castro Valley, CA (US). He has made significant contributions to the field of chemically amplified photoresists, with a focus on imaging acids using pH-dependent fluorophores. His innovative methods have paved the way for advancements in imaging technology.

Latest Patents

Paul Michael Dentinger holds 2 patents. His latest patents include methods and compositions for imaging acids in chemically amplified photoresists using pH-dependent fluorophores. This method involves exposing a chemically amplified photoresist to radiation, which produces an acid that can be visualized through the fluorescence of the pH-dependent fluorophore. The resulting images provide a detailed map of the acid's location within the photoresist, allowing for efficient examination of photoacid generators.

Career Highlights

Throughout his career, Dentinger has demonstrated a commitment to innovation in the field of photoresists. His work has been instrumental in enhancing the understanding of acid generation within these materials, which is crucial for improving the efficiency of photolithography processes.

Collaborations

Paul has collaborated with notable professionals in his field, including Robert David Grober and Scott Josef Bukofsky. These collaborations have further enriched his research and development efforts.

Conclusion

Paul Michael Dentinger's contributions to the field of chemically amplified photoresists highlight his innovative spirit and dedication to advancing imaging technology. His work continues to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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