Ada, MI, United States of America

Paul Matonich

This inventor holds 1 USPTO granted patent. Top assignee: US Footwear Holdings LLC. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Paul Matonich. Retrieved from https://idiyas.com/inventor/paul-matonich-n32a4lv7

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2022

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Paul Matonich: Innovator in Footwear Technology

Introduction

Paul Matonich is a notable inventor based in Ada, MI (US). He has made significant contributions to the footwear industry, particularly through his innovative designs and patents. His work focuses on enhancing the functionality and comfort of footwear.

Latest Patents

Paul Matonich holds a patent for an "Outsole for a boot, shoe, footwear, or the like." This invention showcases his commitment to improving the performance and durability of footwear products. He has successfully secured 1 patent in this area, reflecting his innovative approach to design.

Career Highlights

Matonich is currently associated with US Footwear Holdings LLC, where he continues to develop and refine footwear technologies. His role in the company allows him to collaborate with other talented professionals in the field, contributing to the advancement of footwear design.

Collaborations

Throughout his career, Paul has worked alongside notable colleagues such as Xingui Shi and Gregory J Coyne. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Paul Matonich is a dedicated inventor whose work in footwear technology has made a lasting impact on the industry. His innovative designs and collaborative spirit continue to drive advancements in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…