This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Raytheon Company. Active years: 2016.
Company Filing History:
Years Active: 2016
Title: Paul M Ryan: Innovator in Semiconductor Technology
Introduction
Paul M Ryan is a notable inventor based in Boston, MA (US). He has made significant contributions to the field of semiconductor technology, particularly in photolithography. His innovative work has led to the development of a patent that addresses critical challenges in semiconductor structure formation.
Latest Patents
Paul M Ryan holds a patent titled "Photolithographic, thickness non-uniformity, compensation features for optical photolithographic semiconductor structure formation." This patent describes a semiconductor structure that includes a substrate and an active device formed in an active semiconductor region of the substrate. The active device features a control electrode that regulates the flow of carriers through the active semiconductor region between a pair of electrical contacts. Additionally, the patent introduces a photolithographic, thickness non-uniformity, compensation feature located on the surface substrate off of the active semiconductor region. In one embodiment, this feature comprises pads on the surface of the substrate, enhancing the performance of the semiconductor structure.
Career Highlights
Paul M Ryan is currently employed at Raytheon Company, where he applies his expertise in semiconductor technology. His work at Raytheon has allowed him to contribute to various projects that advance the field of photolithography and semiconductor manufacturing.
Collaborations
Throughout his career, Paul has collaborated with several talented individuals, including Paul J Duval and Christopher J MacDonald. These collaborations have fostered innovation and have led to advancements in semiconductor technology.
Conclusion
Paul M Ryan is a distinguished inventor whose work in semiconductor technology has made a lasting impact. His patent on photolithographic compensation features exemplifies his commitment to innovation in the field. His contributions continue to influence the development of advanced semiconductor structures.