Cork, Ireland

Paul Kearney

This inventor holds 1 USPTO granted patent. Top assignee: Analog Devices International Unlimited Company. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Paul Kearney. Retrieved from https://idiyas.com/inventor/paul-kearney-6657azqv

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Paul Kearney: Innovator in Digital Isolation Technology

Introduction

Paul Kearney is a notable inventor based in Cork City, Ireland. He has made significant contributions to the field of digital isolation technology, particularly in data quality monitoring. With one patent to his name, Kearney's work exemplifies innovation in ensuring data integrity across isolation barriers.

Latest Patents

Kearney's patent, titled "Data quality monitoring across isolation," introduces a digital isolator that enhances the reliability of data transmission. The invention features a receiver that captures digital raw data on the primary side of the isolator. A digital-to-digital encoder is employed to create coded data, which is then transmitted across a transformer and an isolation barrier. The secondary side of the isolator includes a digital-to-digital decoder that decodes the output coded data, assesses error in coupling, and generates an error signal based on the analysis.

Career Highlights

Paul Kearney is currently associated with Analog Devices International Unlimited Company, where he continues to develop innovative solutions in the field of electronics. His expertise in digital isolators has positioned him as a key player in advancing technology that ensures data quality and reliability.

Collaborations

Throughout his career, Kearney has collaborated with talented professionals such as Iku Nagai and Baoxing Chen. These partnerships have fostered a creative environment that encourages the development of cutting-edge

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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