Highlands Ranch, CO, United States of America

Paul Jeffrey Nelson

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Lockheed Martin Corporation. Active years: 2023.

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Innovations of Paul Jeffrey Nelson

Introduction

Paul Jeffrey Nelson is a notable inventor based in Highlands Ranch, Colorado. He has made significant contributions to the field of antenna technology, particularly through his innovative designs and patents. His work is recognized for enhancing the performance and efficiency of aperture antennas.

Latest Patents

Nelson holds a patent for "Aperture antenna arrays with aperture mesh." This patent presents various enhanced arrangements for arrays of aperture antennas, such as horn antennas or short backfire antennas. The invention includes an array of aperture antennas featuring a wall thickness between apertures, along with a conductive mesh positioned above the apertures. The openings of the conductive mesh are aligned with the apertures, maintaining a selected spacing between the mesh and the apertures, which optimizes antenna performance.

Career Highlights

Paul Jeffrey Nelson is currently employed at Lockheed Martin Corporation, a leading aerospace and defense company. His role at Lockheed Martin allows him to apply his expertise in antenna technology to various projects, contributing to advancements in communication systems and defense applications.

Collaborations

Nelson collaborates with Erik Lier, a fellow innovator at Lockheed Martin. Together, they work on projects that leverage their combined knowledge and skills in antenna design and technology.

Conclusion

Paul Jeffrey Nelson's contributions to antenna technology through his patent and work at Lockheed Martin highlight his innovative spirit and dedication to advancing communication systems. His inventions continue to influence the field and pave the way for future developments.

Profile summary based on public USPTO records.
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