Paul J Howell

Title: Paul J Howell: Innovator in Integrated Circuit Technology

Introduction

Paul J Howell is a notable inventor based in Federal Way, WA (US). He has made significant contributions to the field of integrated circuit technology, holding a total of 2 patents. His work focuses on processes that enhance the fabrication of both bipolar and complementary field effect transistors.

Latest Patents

One of Howell's latest patents is the "Selective Epitaxy BiCMOS Process." This innovative process allows for the fabrication of both bipolar and complementary field effect transistors within an integrated circuit. The method begins with a P-type substrate and an N-type epitaxial layer, followed by the removal of specific layers to create regions for NMOS devices. The process includes forming a layer of silicon dioxide over the sidewalls of the protruding regions and further epitaxial deposition to reform the epitaxial layer. This results in the successful fabrication of bipolar and field effect transistors in separate regions.

Another significant patent is the "Enhanced Density Modified Isoplanar Process." This improved method for fabricating modified isoplanar integrated circuits incorporates several interactive process steps. It begins with oxide isolation of epitaxial islands, followed by an enhanced single polycrystalline layer process that eliminates certain masking and etching steps. Additionally, Howell's process provides a new method for dielectrically isolating contact locations on different surface levels of the integrated circuit structure, ensuring that all electrical contact locations are at the same substantially isoplanar level.

Career Highlights

Throughout his career, Paul J Howell has worked with prominent companies in the semiconductor industry, including Fairchild Semiconductor Corporation and National Semiconductor Corporation. His expertise in integrated circuit technology has made him a valuable asset in these organizations.

Collaborations

Some of Howell's notable coworkers include Donald J Desbiens and John W Eldridge. Their collaborative efforts have contributed to advancements in semiconductor technology.

Conclusion

Paul J Howell's innovative work in integrated circuit technology has led to significant advancements in the field. His patents reflect a deep understanding of semiconductor processes, and his contributions continue to influence the industry.