Paul J Decker

Title: Paul J Decker: Innovator in CVD Technology

Introduction

Paul J Decker is a notable inventor based in Ridge, NY (US), recognized for his contributions to chemical vapor deposition (CVD) technology. He holds a patent that significantly enhances the efficiency and effectiveness of CVD systems, making a substantial impact in the field.

Latest Patents

Decker's most recent patent is for a High-throughput CVD system. This innovative design incorporates deposition modules grouped for each CVD deposition position, which includes at least two deposition modules. The system is equipped with a Motion Control System that manages and confines the motion of these deposition modules. This advancement allows for quick exchanges of deposition modules at both On-Line and Off-Line CVD coating systems. The result is a high-volume, large-area CVD coating system that boosts the commercial viability of CVD designs through increased production throughput, reduced costs, enhanced process flexibility, and improved film quality.

Career Highlights

Paul J Decker is associated with CVD Equipment Corporation, where he applies his expertise in developing cutting-edge CVD technologies. His work has been instrumental in advancing the capabilities of CVD systems, making them more efficient and commercially viable.

Collaborations

Decker has collaborated with notable professionals in the field, including Leonard A Rosenbaum and Karlheinz Strobl. These partnerships have contributed to the development and refinement of innovative CVD technologies.

Conclusion

Paul J Decker's contributions to CVD technology through his innovative patent demonstrate his commitment to enhancing industrial processes. His work continues to influence the field, paving the way for future advancements in CVD systems.