Seattle, WA, United States of America

Paul Benjamin Albee

This inventor holds 1 USPTO granted patent. Top assignee: Vulcan Inc.. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Paul Benjamin Albee. Retrieved from https://idiyas.com/inventor/paul-benjamin-albee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Paul Benjamin Albee: Innovator in High-Precision Detection Technology

Introduction

Paul Benjamin Albee is a notable inventor based in Seattle, WA (US). He has made significant contributions to the field of image processing and detection technology. With a focus on high-precision detection of homogeneous object activity, Albee's work has the potential to impact various industries.

Latest Patents

Albee holds a patent for "High-precision detection of homogeneous object activity in a sequence of images." This innovative technology involves aligning a first image with a second image to compute motion values based on pixel differences. The process generates an impact score that indicates whether damage has occurred among objects represented in the images. This patent showcases Albee's expertise in developing advanced detection methods.

Career Highlights

Albee is currently employed at Vulcan Inc., where he continues to push the boundaries of technology. His work at Vulcan has allowed him to collaborate with other talented professionals in the field.

Collaborations

Some of Albee's coworkers include Michael Persiantsev and Cecil Lee Quartey. Their combined efforts contribute to the innovative environment at Vulcan Inc.

Conclusion

Paul Benjamin Albee is a distinguished inventor whose work in high-precision detection technology exemplifies innovation in image processing. His contributions are paving the way for advancements in various applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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