Corning, NY, United States of America

Pattarin McLaren

This inventor holds 1 USPTO granted patent. Top assignee: Corning Incorporated. Active years: 2012.


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2012

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1 patent (USPTO):Explore Patents

Title: Pattarin McLaren: Innovator in Fused Silica Technology

Introduction

Pattarin McLaren is a notable inventor based in Corning, NY (US). He has made significant contributions to the field of fused silica technology. His innovative approach has led to the development of a unique method for forming fused silica plates.

Latest Patents

Pattarin McLaren holds a patent for a "Fused silica blank and method of forming a fused silica plate from the same." This patent describes a method that includes providing a fused silica blank with specific dimensions and forming a slot that extends from the outer diameter to a location at or offset from the center. The method emphasizes the creation of a concave surface and chamfered connections, ultimately allowing for the rolling out of the fused silica blank to form a plate.

Career Highlights

Pattarin McLaren is associated with Corning Incorporated, a company renowned for its advancements in materials science. His work has contributed to the company's reputation as a leader in innovative glass and ceramics technology. With 1 patent to his name, McLaren exemplifies the spirit of innovation that drives the industry forward.

Collaborations

Throughout his career, Pattarin has collaborated with talented individuals such as James Gerard Fagan and Daniel Raymond Sempolinski. These partnerships have fostered an environment of creativity and shared knowledge, enhancing the development of new technologies.

Conclusion

Pattarin McLaren's contributions to fused silica technology highlight his role as an innovator in the field. His patent and collaborations reflect a commitment to advancing material science. His work continues to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
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