Patrick T Hurley

Title: Innovations of Patrick T Hurley

Introduction

Patrick T Hurley is an accomplished inventor based in Appleton, WI (US). He has made significant contributions to the field of silicon technology, holding 2 patents that showcase his innovative approach to functionalized silicon surfaces. His work is characterized by a focus on creating advanced materials with specific properties.

Latest Patents

One of his latest patents is titled "Patterned Functionalized Silicon Surfaces." This invention provides a method for preparing a silicon substrate that features a silicon surface comprising a pattern of covalently bound monolayers. Each of these monolayers includes an alkyne, with at least a portion of each monolayer being no more than about 5 molecules of the alkyne wide. This innovative approach has the potential to enhance the functionality of silicon surfaces in various applications.

Career Highlights

Patrick T Hurley is associated with the Purdue Research Foundation, where he continues to develop and refine his inventions. His work has garnered attention for its practical applications and contributions to the field of materials science.

Collaborations

He collaborates with Jillian Mary Buriak, a fellow researcher, to further explore the possibilities of silicon technology and its applications.

Conclusion

Patrick T Hurley is a notable inventor whose work in patterned functionalized silicon surfaces demonstrates his commitment to innovation. His contributions to the field are paving the way for advancements in material science and technology.