Seattle, WA, United States of America

Patrick Shih

This inventor holds 1 USPTO granted patent. Top assignee: Microsoft Technology Licensing, LLC. Active years: 2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Patrick Shih. Retrieved from https://idiyas.com/inventor/patrick-shih

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 24(Granted Patents)


Company Filing History:


Years Active: 2011

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1 patent (USPTO):Explore Patents

Title: The Innovations of Patrick Shih

Introduction

Patrick Shih is an accomplished inventor based in Seattle, WA. He is known for his contributions to technology, particularly in user interface design. With a focus on enhancing user experience, Patrick has made significant strides in the field of display technology.

Latest Patents

Patrick holds a patent for a "Display screen with a user interface." This innovation reflects his commitment to improving how users interact with digital displays. His work has the potential to influence various applications in technology and design.

Career Highlights

Patrick is currently employed at Microsoft Technology Licensing, LLC. His role at this leading technology company allows him to work on cutting-edge projects that shape the future of user interfaces. With 1 patent to his name, he has established himself as a valuable contributor to the field.

Collaborations

Throughout his career, Patrick has collaborated with notable colleagues, including John Daniel Hayes Leonard and Wilhelmina P Dietrich. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Patrick Shih's work exemplifies the spirit of innovation in technology. His contributions to user interface design continue to impact the industry positively. As he progresses in his career, his future endeavors are sure to inspire further advancements in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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