Company Filing History:
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1 out of 58,132 
Years Active: 2008-2011
Title: The Innovative Contributions of Patrick Pan
Introduction
Patrick Pan is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of image processing, particularly in the development of methods and devices that enhance image stitching accuracy. With a total of four patents to his name, Pan's work addresses critical challenges in multi-camera systems.
Latest Patents
Among his latest patents is a method for improving image stitching accuracy with lens distortion correction. This invention provides a solution for correcting lens distortion before stitching images captured by a multi-camera system. By ensuring that features in the overlapping regions are matched, a seamless wide-angle image is generated. Another significant patent is the advanced dynamic stitching method for multi-lens camera systems. This invention tackles the parallax phenomenon that occurs in multi-lens setups. It introduces a fast search engine that dynamically updates stitching points, reducing the computational power required by traditional methods.
Career Highlights
Patrick Pan has worked with prominent companies such as Sony Taiwan Limited and Epopack Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to innovative projects in the field of imaging technology.
Collaborations
Some of his notable coworkers include Tatsumi Mitsushita and Christine Lin. Their collaboration has likely fostered an environment of creativity and innovation, leading to advancements in their respective fields.
Conclusion
Patrick Pan's contributions to image processing and multi-camera systems highlight his role as a significant inventor in the technology sector. His patents reflect a commitment to solving complex problems and enhancing the quality of image capture.