The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 01, 2011
Filed:
Apr. 09, 2007
Patrick Pan, Taipei, TW;
Christine Lin, Taipei, TW;
Benjamin Kuo, Taipei, TW;
Tatsumi Mitsushita, Taipei, TW;
Patrick Pan, Taipei, TW;
Christine Lin, Taipei, TW;
Benjamin Kuo, Taipei, TW;
Tatsumi Mitsushita, Taipei, TW;
Sony Taiwan Limited, Taipei, TW;
Abstract
The invention provides a method for improving image stitching accuracy and a device for implementing the same, which apply to the multi-camera system for wide-angle image generation. Lens distortion causes mismatches of the features in the overlapping region of the images captured by the multi-camera system. As a result, the mismatches on the stitched wide-angle image are visible. The method and device for improving image stitching accuracy correct the lens distortion before stitching the images captured by the multi-camera system, so that the features in the overlapping region are matched and a seamless wide-angle image is generated by the stitching engine.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile