Company Filing History:
Years Active: 1999-2000
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Title: Innovator Spotlight: Patrick Paino - Pioneering Wafer Cleaning Technologies
Introduction:
Patrick Paino, a talented inventor based in Otisville, NY, has been making waves in the technology sector with his groundbreaking innovations. With a keen eye for detail and a passion for problem-solving, Patrick has solidified his place as a leading figure in the realm of semiconductor wafer cleaning technologies.
Latest Patents:
1. Method for processing a substrate using a system having a roller with treading: Patrick's innovative method involves rotating wafers in a double-sided scrubber, where a specially designed roller imparts rotary motion to semiconductor wafers during the cleaning process. The unique design ensures efficient and effective cleaning without slippage.
2. Roller with treading and system including the same: This patent further elaborates on the intricacies of the rotating roller system, emphasizing the importance of maintaining contact at the outer edges to facilitate optimal wafer rotation and cleaning.
Career Highlights:
Currently employed at Ontrak Systems, Inc., a prominent player in the semiconductor equipment industry, Patrick Paino continues to push the boundaries of technological advancement. His dedication to enhancing wafer processing methodologies has garnered him recognition as a key innovator in the field.
Collaborations:
Throughout his career, Patrick has worked closely with esteemed colleagues such as Alan John Jensen and Norman A. Mertke. Their collaborative efforts have led to the successful development and implementation of cutting-edge technologies within the semiconductor sector.
Conclusion:
In conclusion, Patrick Paino's remarkable contributions to wafer cleaning technologies underscore his unwavering commitment to innovation and excellence. By continually striving to improve upon existing methodologies, Patrick exemplifies the true spirit of invention and serves as a beacon of inspiration for aspiring innovators worldwide.
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