This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignees: Champalle, Commissariat a L'energie Atomique Et Aux Energies Alternatives. Active years: 2018.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:

Years Active: 2018
Title: The Innovative Contributions of Patrick Moyer
Introduction
Patrick Moyer is a notable inventor based in Bagnols sur Ceze, France. He has made significant contributions to the field of engineering, particularly in the development of specialized machinery. His work focuses on creating solutions that can operate in challenging environments.
Latest Patents
Moyer holds a patent for a "Press for shaping pellets in a restricted and hostile environment and method for assembling the press." This invention features a uniaxial press designed to shape pellets by compressing powder in a die using punches. The press is uniquely suited for use in confined and hostile environments, incorporating small modules that can be transported through narrow openings. These modules can be assembled remotely, allowing for operation in spaces that would otherwise be inaccessible. The actuation of the press is primarily electromechanical, enhancing its efficiency and reliability.
Career Highlights
Throughout his career, Patrick Moyer has worked with prominent organizations, including the Commissariat à l'Énergie Atomique et aux Énergies Alternatives and Champalle. His experience in these institutions has allowed him to refine his skills and contribute to various innovative projects.
Collaborations
Moyer has collaborated with several professionals in his field, including Patrik Gosset and Patrick Baptiste. These partnerships have fostered a creative environment that encourages the exchange of ideas and advancements in technology.
Conclusion
Patrick Moyer's innovative work in developing machinery for hostile environments showcases his expertise and dedication to engineering. His contributions continue to influence the field and inspire future inventions.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile