Company Filing History:
Years Active: 2007
Title: Patrick Marrow: Innovator in Microelectronics
Introduction
Patrick Marrow is a notable inventor based in Portland, OR (US). He has made significant contributions to the field of microelectronics, particularly through his innovative patent. His work is recognized for its impact on the development of advanced microelectronic devices.
Latest Patents
Patrick Marrow holds a patent titled "Structure in a microelectronic device including a bi-layer for a diffusion barrier and an etch-stop layer." This invention relates to a microelectronic device and a structure that includes a diffusion barrier layer with a first thickness and a first dielectric constant. An etch stop layer is positioned above the diffusion barrier layer, featuring a second thickness and a second dielectric constant. This innovation enhances the performance and reliability of microelectronic devices.
Career Highlights
Patrick Marrow is currently employed at Intel Corporation, a leading company in the technology sector. His role at Intel allows him to work on cutting-edge technologies and contribute to the advancement of microelectronics. His expertise and innovative mindset have positioned him as a valuable asset to the company.
Collaborations
Throughout his career, Patrick has collaborated with talented individuals such as Grant M Kloster and Jihperng Leu. These collaborations have fostered a creative environment that encourages the development of groundbreaking technologies.
Conclusion
Patrick Marrow's contributions to microelectronics through his patent and work at Intel Corporation highlight his role as an influential inventor in the field. His innovative spirit continues to drive advancements in technology, making a lasting impact on the industry.