Patrick M. Jeffries is a notable inventor based in Pittsford, NY (US). He has made significant contributions to the field of photographic and radiographic elements, holding a total of 6 patents. His work has been instrumental in advancing technologies that enhance imaging processes.

Latest Patents

Among his latest patents, one includes a photographic element containing an elastomeric matting agent. This invention provides a photographic element that comprises a support, at least one hydrophilic light-sensitive layer, and a light-insensitive layer containing a binder and polymer matte particles. Another significant patent focuses on radiographic elements that exhibit reduced gloss non-uniformities. This innovation allows medical diagnostic radiographic elements to be processed in less than 45 seconds while reducing gloss non-uniformities. The reduction is attributed to the presence of a hydrophilic colloid layer overlying the imaging layer unit, which contains radiation-sensitive nontabular silver halide grains.

Career Highlights

Patrick M. Jeffries has had a distinguished career, primarily working with Eastman Kodak Company. His expertise in imaging technologies has led to numerous advancements in the field, making him a respected figure among his peers.

Collaborations

Throughout his career, Patrick has collaborated with notable coworkers such as Robert E. Dickerson and Franklin C. Brayer. These collaborations have further enriched his contributions to the field of imaging technologies.

Conclusion

In summary, Patrick M. Jeffries is a prominent inventor whose work in photographic and radiographic elements has significantly impacted the industry. His innovative patents and collaborations highlight his dedication to advancing imaging technologies.

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