Placitas, NM, United States of America

Patrick Louis Ponsardin




Average Co-Inventor Count = 3.1

ph-index = 4

Forward Citations = 49(Granted Patents)


Location History:

  • Placita, NM (US) (2008)
  • Placitas, NM (US) (2004 - 2013)

Company Filing History:


Years Active: 2004-2013

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5 patents (USPTO):Explore Patents

Title: Patrick Louis Ponsardin: Innovator in Simulation and Detection Technologies

Introduction

Patrick Louis Ponsardin is an accomplished inventor based in Placitas, NM (US). He holds a total of 5 patents that showcase his expertise in simulation and detection technologies. His innovative work has contributed significantly to advancements in various fields.

Latest Patents

Among his latest patents is the "Virtual Scene Generator and Probability of Interception System and Method." This invention provides techniques for simulating the dissemination of at least one target substance in a contaminated scene. The system allows users to select target substances and scene parameters for simulation. It generates data that illustrates the results statistically and graphically. Another notable patent is the "Method, Apparatus and System for Rapid and Sensitive Standoff Detection of Surface Contaminants." This system enables fast and sensitive detection of surface hazards with high data throughput and spatial resolution. It includes a hand-held unit that directs an excitation beam onto a surface and captures scattered radiation for analysis.

Career Highlights

Patrick has worked with notable companies such as Itt Manufacturing Enterprises, Inc. and Exelis Inc. His experience in these organizations has further honed his skills in developing innovative technologies.

Collaborations

Throughout his career, Patrick has collaborated with talented individuals, including Christopher Scott Kletecka and Jeromy Paul Rezac. These partnerships have contributed to the success of his projects and inventions.

Conclusion

Patrick Louis Ponsardin is a distinguished inventor whose work in simulation and detection technologies has made a significant impact. His contributions continue to influence advancements in various applications.

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