Omaha, NE, United States of America

Patrick Keep

This inventor holds 1 USPTO granted patent, plus 1 CIPO patent. Top assignee: Election Systems & Software, LLC. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Patrick Keep. Retrieved from https://idiyas.com/inventor/patrick-keep

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0


Average Co-Inventor Count = 1.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: The Innovations of Patrick Keep

Introduction

Patrick Keep is an accomplished inventor based in Omaha, Nebraska. He has made significant contributions to the field of technology with his innovative designs. His work focuses on enhancing security and functionality in everyday products.

Latest Patents

Patrick Keep holds a patent for a tamper-evident attachment for cable ties. This invention includes a ratchet head cover that couples to the ratchet head of the cable tie. The design inhibits access to the pawl in the ratchet head, ensuring that the integrity of the cable tie remains intact. The ratchet head cover features at least one slot-shaped opening that aligns with the head opening of the ratchet head, allowing a strap of the cable tie to pass through while maintaining security.

Career Highlights

Patrick Keep is currently employed at Election Systems & Software, LLC. His role at the company allows him to apply his inventive skills to develop solutions that enhance the security of election processes. His dedication to innovation is evident in his work and contributions to the industry.

Collaborations

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Conclusion

Patrick Keep's innovative spirit and dedication to enhancing security through his inventions make him a notable figure in the field of technology. His patent for a tamper-evident attachment for cable ties exemplifies his commitment to creating practical solutions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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