Zurich, Switzerland

Patrick Habegger

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Polariton Technologies Ag. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Patrick Habegger. Retrieved from https://idiyas.com/inventor/patrick-habegger

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Patrick Habegger: Innovator in Plasmonic Technology

Introduction

Patrick Habegger is a notable inventor based in Zurich, Switzerland. He has made significant contributions to the field of plasmonic devices, showcasing his expertise through innovative patents.

Latest Patents

Patrick Habegger holds a patent for a plasmonic device and a method for fabricating such a device. The invention relates to a plasmonic device that comprises a substrate on which a plasmonic section is arranged. This section includes at least one inorganic confining structure adjacent to an organic optical material, which provides a plasmonic waveguide. The organic optical material is arranged in a limited area through specific processes. Additionally, a protective layer is deposited to cover and/or enclose the organic optical material, enhancing the reliability of the plasmonic waveguide.

Career Highlights

Patrick is associated with Polariton Technologies AG, where he applies his knowledge and skills in plasmonic technology. His work has contributed to advancements in the field, particularly in the development of reliable plasmonic devices.

Collaborations

He collaborates with notable colleagues, including Wolfgang Heni and Eva De Leo, who share his passion for innovation in technology.

Conclusion

Patrick Habegger's work in plasmonic devices exemplifies the intersection of creativity and technology. His contributions are paving the way for future advancements in this exciting field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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